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A Hybrid ECO Detailed Placement Flow for Mitigating Dynamic IR Drop (UC San Diego)

A new technical paper titled “A Hybrid ECO Detailed Placement Flow for Improved Reduction of Dynamic IR Drop” was published by researchers at UC San Diego.

Abstract:

“With advanced semiconductor technology progressing well into sub-7nm scale, voltage drop has become an increasingly challenging issue. As a result, there has been extensive research focused on predicting and mitigating dynamic IR drops, leading to the development of IR drop engineering change order (ECO) flows – often integrated with modern commercial EDA tools. However, these tools encounter QoR limitations while mitigating IR drop. To address this, we propose a hybrid ECO detailed placement approach that is integrated with existing commercial EDA flows, to mitigate excessive peak current demands within power and ground rails. Our proposed hybrid approach effectively optimizes peak current levels within a specified “clip”– complementing and enhancing commercial EDA dynamic IR-driven ECO detailed placements. In particular, we: (i) order instances in a netlist in decreasing order of worst voltage drop; (ii) extract a clip around each instance; and (iii) solve an integer linear programming (ILP) problem to optimize instance placements. Our approach optimizes dynamic voltage drops (DVD) across ten designs by up to 15.3% compared to original conventional flows, with similar timing quality and 55.1% less runtime.”

Find the technical paper here. Published June 2024.

Andrew B. Kahng, Bodhisatta Pramanik, and Mingyu Woo. 2024. A Hybrid ECO Detailed Placement Flow for Improved Reduction of Dynamic IR Drop. In Proceedings of the Great Lakes Symposium on VLSI 2024 (GLSVLSI ’24). Association for Computing Machinery, New York, NY, USA, 390–396. https://doi.org/10.1145/3649476.3658727.

The post A Hybrid ECO Detailed Placement Flow for Mitigating Dynamic IR Drop (UC San Diego) appeared first on Semiconductor Engineering.

A Hybrid ECO Detailed Placement Flow for Mitigating Dynamic IR Drop (UC San Diego)

A new technical paper titled “A Hybrid ECO Detailed Placement Flow for Improved Reduction of Dynamic IR Drop” was published by researchers at UC San Diego.

Abstract:

“With advanced semiconductor technology progressing well into sub-7nm scale, voltage drop has become an increasingly challenging issue. As a result, there has been extensive research focused on predicting and mitigating dynamic IR drops, leading to the development of IR drop engineering change order (ECO) flows – often integrated with modern commercial EDA tools. However, these tools encounter QoR limitations while mitigating IR drop. To address this, we propose a hybrid ECO detailed placement approach that is integrated with existing commercial EDA flows, to mitigate excessive peak current demands within power and ground rails. Our proposed hybrid approach effectively optimizes peak current levels within a specified “clip”– complementing and enhancing commercial EDA dynamic IR-driven ECO detailed placements. In particular, we: (i) order instances in a netlist in decreasing order of worst voltage drop; (ii) extract a clip around each instance; and (iii) solve an integer linear programming (ILP) problem to optimize instance placements. Our approach optimizes dynamic voltage drops (DVD) across ten designs by up to 15.3% compared to original conventional flows, with similar timing quality and 55.1% less runtime.”

Find the technical paper here. Published June 2024.

Andrew B. Kahng, Bodhisatta Pramanik, and Mingyu Woo. 2024. A Hybrid ECO Detailed Placement Flow for Improved Reduction of Dynamic IR Drop. In Proceedings of the Great Lakes Symposium on VLSI 2024 (GLSVLSI ’24). Association for Computing Machinery, New York, NY, USA, 390–396. https://doi.org/10.1145/3649476.3658727.

The post A Hybrid ECO Detailed Placement Flow for Mitigating Dynamic IR Drop (UC San Diego) appeared first on Semiconductor Engineering.

Using Formal Verification To Evaluate The HW Reliability Of A RISC-V Ibex Core In The Presence Of Soft Errors

A technical paper titled “Using Formal Verification to Evaluate Single Event Upsets in a RISC-V Core” was published by researchers at University of Southampton.

Abstract:

“Reliability has been a major concern in embedded systems. Higher transistor density and lower voltage supply increase the vulnerability of embedded systems to soft errors. A Single Event Upset (SEU), which is also called a soft error, can reverse a bit in a sequential element, resulting in a system failure. Simulation-based fault injection has been widely used to evaluate reliability, as suggested by ISO26262. However, it is practically impossible to test all faults for a complex design. Random fault injection is a compromise that reduces accuracy and fault coverage. Formal verification is an alternative approach. In this paper, we use formal verification, in the form of model checking, to evaluate the hardware reliability of a RISC-V Ibex Core in the presence of soft errors. Backward tracing is performed to identify and categorize faults according to their effects (no effect, Silent Data Corruption, crashes, and hangs). By using formal verification, the entire state space and fault list can be exhaustively explored. It is found that misaligned instructions can amplify fault effects. It is also found that some bits are more vulnerable to SEUs than others. In general, most of the bits in the Ibex Core are vulnerable to Silent Data Corruption, and the second pipeline stage is more vulnerable to Silent Data Corruption than the first.”

Find the technical paper here. Published May 2024 (preprint).

Xue, Bing, and Mark Zwolinski. “Using Formal Verification to Evaluate Single Event Upsets in a RISC-V Core.” arXiv preprint arXiv:2405.12089 (2024).

Related Reading
Formal Verification’s Usefulness Widens
Demand for IC reliability pushes formal into new applications, where complex interactions and security risks are difficult to solve with other tools.
RISC-V Micro-Architectural Verification
Verifying a processor is much more than making sure the instructions work, but the industry is building from a limited knowledge base and few dedicated tools.

The post Using Formal Verification To Evaluate The HW Reliability Of A RISC-V Ibex Core In The Presence Of Soft Errors appeared first on Semiconductor Engineering.

Competitive Open-Source EDA Tools

A technical paper titled “Basilisk: Achieving Competitive Performance with Open EDA Tools on an Open-Source Linux-Capable RISC-V SoC” was published by researchers at ETH Zurich and University of Bologna.

Abstract:

“We introduce Basilisk, an optimized application-specific integrated circuit (ASIC) implementation and design flow building on the end-to-end open-source Iguana system-on-chip (SoC). We present enhancements to synthesis tools and logic optimization scripts improving quality of results (QoR), as well as an optimized physical design with an improved power grid and cell placement integration enabling a higher core utilization. The tapeout-ready version of Basilisk implemented in IHP’s open 130 nm technology achieves an operation frequency of 77 MHz (51 logic levels) under typical conditions, a 2.3x improvement compared to the baseline open-source EDA design flow presented in Iguana, and a higher 55% core utilization compared to 50% in the baseline design. Through collaboration with EDA tool developers and domain experts, Basilisk exemplifies a synergistic effort towards competitive open-source electronic design automation (EDA) tools for research and industry applications.”

Find the technical paper here. Published May 2024.

Sauter, Phillippe, Thomas Benz, Paul Scheffler, Zerun Jiang, Beat Muheim, Frank K. Gürkaynak, and Luca Benini. “Basilisk: Achieving Competitive Performance with Open EDA Tools on an Open-Source Linux-Capable RISC-V SoC.” arXiv preprint arXiv:2405.03523 (2024).

Related Reading
EDA Back On Investors’ Radar
Big changes are fueling growth, and it’s showing in EDA revenue, acquisitions, and stock prices.
RISC-V Wants All Your Cores
It is not enough to want to dominate the world of CPUs. RISC-V has every core in its sights, and it’s starting to take steps to get there.

The post Competitive Open-Source EDA Tools appeared first on Semiconductor Engineering.

Distributing RTL Simulation Across Thousands Of Cores On 4 IPU Sockets (EPFL)

A technical paper titled “Parendi: Thousand-Way Parallel RTL Simulation” was published by researchers at EPFL.

Abstract:

“Hardware development relies on simulations, particularly cycle-accurate RTL (Register Transfer Level) simulations, which consume significant time. As single-processor performance grows only slowly, conventional, single-threaded RTL simulation is becoming less practical for increasingly complex chips and systems. A solution is parallel RTL simulation, where ideally, simulators could run on thousands of parallel cores. However, existing simulators can only exploit tens of cores.
This paper studies the challenges inherent in running parallel RTL simulation on a multi-thousand-core machine (the Graphcore IPU, a 1472-core machine). Simulation performance requires balancing three factors: synchronization, communication, and computation. We experimentally evaluate each metric and analyze how it affects parallel simulation speed, drawing on contrasts between the large-scale IPU and smaller but faster x86 systems.
Using this analysis, we build Parendi, an RTL simulator for the IPU. It distributes RTL simulation across 5888 cores on 4 IPU sockets. Parendi runs large RTL designs up to 4x faster than a powerful, state-of-the-art x86 multicore system.”

Find the technical paper here. Published March 2024 (preprint).

Emami, Mahyar, Thomas Bourgeat, and James Larus. “Parendi: Thousand-Way Parallel RTL Simulation.” arXiv preprint arXiv:2403.04714 (2024).

Related Reading
Anatomy Of A System Simulation
Balancing the benefits of a model with the costs associated with that model is tough, but it becomes even trickier when dissimilar models are combined.

The post Distributing RTL Simulation Across Thousands Of Cores On 4 IPU Sockets (EPFL) appeared first on Semiconductor Engineering.

Merging Power and Arithmetic Optimization Via Datapath Rewriting (Intel, Imperial College London)

A new technical paper titled “Combining Power and Arithmetic Optimization via Datapath Rewriting” was published by researchers at Intel Corporation and Imperial College London.

Abstract:
“Industrial datapath designers consider dynamic power consumption to be a key metric. Arithmetic circuits contribute a major component of total chip power consumption and are therefore a common target for power optimization. While arithmetic circuit area and dynamic power consumption are often correlated, there is also a tradeoff to consider, as additional gates can be added to explicitly reduce arithmetic circuit activity and hence reduce power consumption. In this work, we consider two forms of power optimization and their interaction: circuit area reduction via arithmetic optimization, and the elimination of redundant computations using both data and clock gating. By encoding both these classes of optimization as local rewrites of expressions, our tool flow can simultaneously explore them, uncovering new opportunities for power saving through arithmetic rewrites using the e-graph data structure. Since power consumption is highly dependent upon the workload performed by the circuit, our tool flow facilitates a data dependent design paradigm, where an implementation is automatically tailored to particular contexts of data activity. We develop an automated RTL to RTL optimization framework, ROVER, that takes circuit input stimuli and generates power-efficient architectures. We evaluate the effectiveness on both open-source arithmetic benchmarks and benchmarks derived from Intel production examples. The tool is able to reduce the total power consumption by up to 33.9%.”

Find the technical paper here. Published April 2024.

Samuel Coward, Theo Drane, Emiliano Morini, George Constantinides; arXiv:2404.12336v1.

The post Merging Power and Arithmetic Optimization Via Datapath Rewriting (Intel, Imperial College London) appeared first on Semiconductor Engineering.

Merging Power and Arithmetic Optimization Via Datapath Rewriting (Intel, Imperial College London)

A new technical paper titled “Combining Power and Arithmetic Optimization via Datapath Rewriting” was published by researchers at Intel Corporation and Imperial College London.

Abstract:
“Industrial datapath designers consider dynamic power consumption to be a key metric. Arithmetic circuits contribute a major component of total chip power consumption and are therefore a common target for power optimization. While arithmetic circuit area and dynamic power consumption are often correlated, there is also a tradeoff to consider, as additional gates can be added to explicitly reduce arithmetic circuit activity and hence reduce power consumption. In this work, we consider two forms of power optimization and their interaction: circuit area reduction via arithmetic optimization, and the elimination of redundant computations using both data and clock gating. By encoding both these classes of optimization as local rewrites of expressions, our tool flow can simultaneously explore them, uncovering new opportunities for power saving through arithmetic rewrites using the e-graph data structure. Since power consumption is highly dependent upon the workload performed by the circuit, our tool flow facilitates a data dependent design paradigm, where an implementation is automatically tailored to particular contexts of data activity. We develop an automated RTL to RTL optimization framework, ROVER, that takes circuit input stimuli and generates power-efficient architectures. We evaluate the effectiveness on both open-source arithmetic benchmarks and benchmarks derived from Intel production examples. The tool is able to reduce the total power consumption by up to 33.9%.”

Find the technical paper here. Published April 2024.

Samuel Coward, Theo Drane, Emiliano Morini, George Constantinides; arXiv:2404.12336v1.

The post Merging Power and Arithmetic Optimization Via Datapath Rewriting (Intel, Imperial College London) appeared first on Semiconductor Engineering.

Impact of Scaling and BEOL Technology Solutions At The 7nm Node On MRAM

A technical paper titled “Impact of Technology Scaling and Back-End-of-the-Line Technology Solutions on Magnetic Random-Access Memories” was published by researchers at Georgia Institute of Technology.

Abstract:

“While magnetic random-access memories (MRAMs) are promising because of their nonvolatility, relatively fast speeds, and high endurance, there are major challenges in adopting them for the advanced technology nodes. One of the major challenges in scaling MRAM devices is caused by the ever-increasing resistances of interconnects. In this article, we first study the impact of shrunk interconnect dimensions on MRAM performance at various technology nodes. Then, we investigate the impact of various potential back-end-of-the-line (BEOL) technology solutions at the 7 nm node. Based on interconnect resistance values from technology computer-aided design (TCAD) simulations and MRAM device characteristics from experimentally validated/calibrated physical models, we quantify the potential array-level performance of MRAM using SPICE simulations. We project that some potential BEOL technology solutions can reduce the write energy by up to 34.6% with spin-orbit torque (SOT) MRAM and 29.0% with spin-transfer torque (STT) MRAM. We also observe up to 21.4% reduction in the read energy of the SOT-MRAM arrays.”

Find the technical paper here. Published January 2024.

P. Kumar, D. E. Shim, S. Narla and A. Naeemi, “Impact of Technology Scaling and Back-End-of-the-Line Technology Solutions on Magnetic Random-Access Memories,” in IEEE Journal on Exploratory Solid-State Computational Devices and Circuits, vol. 10, pp. 13-21, 2024, doi: 10.1109/JXCDC.2024.3357625.

Related Reading
MRAM Getting More Attention At Smallest Nodes
Why this 25-year-old technology may be the memory of choice for leading edge designs and in automotive applications.
ReRAM Seeks To Replace NOR
There is increased interest in ReRAM for embedded computing, especially in automotive applications, as more of its known issues are solved. Nevertheless, there is no one-size-fits-all NVM.

The post Impact of Scaling and BEOL Technology Solutions At The 7nm Node On MRAM appeared first on Semiconductor Engineering.

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